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21 - 25 February 2010 San Jose Convention Center San Jose,
California,
USA |
Optical lithography, resists, metrology, EUV, immersion, and more at SPIE Advanced Lithography

SPIE Advanced Lithography 2010 concluded Thursday 25 March. Next year's event will be held 27 February through 4 March 2011 in San Jose.
For information and photos from plenaries, the exhibition, the technical program, and special events see the Onsite News, the Photo Gallery, and the Mock Trial Photo Gallery.
Conference topics: | • | EUV—sources, components, yields, resists, modeling | | • | Alternative Technologies—maskless, nano-imprint, directed self-assembly | | • | Optical lithography—computational, double patterning, SMO, OPC, RET | | • | Metrology, inspection, process control, LER/LWR, mask litho, DBM | | • | Resists materials and processing, double patterning, immersion, LER | | • | DFM/DPI—co-optimization, layout, electrical, methodologies | Plenary Speakers:  Kazuo Ushida President Precision Equipment Co. Nikon Corp. |  Eric Chen Managing Director Silver Lake Partners |  Sam Sivakumar Director of Lithography Portland Technology Development Group Intel Corp. | Other program information: Sponsor Cooperating Organization
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Symposium Chair
Christopher J. Progler, Photronics Inc.
Symposium Co-chair
Donis G. Flagello, Nikon Research Corp. of America
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