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SPIE Advanced Lithography 21 - 25 February 2010
San Jose Convention Center
San Jose, California, USA

Optical lithography, resists, metrology, EUV, immersion, and more at SPIE Advanced Lithography

Lisa Su, Senior Vice President and Chief Technology Officer for Freescale Semiconductor, Inc. delivers her Plenary Presentation at the 2009 meeting.


SPIE Advanced Lithography 2010 concluded Thursday 25 March. Next year's event will be held 27 February through 4 March 2011 in San Jose.

For information and photos from plenaries, the exhibition, the technical program, and special events see the Onsite News, the Photo Gallery, and the Mock Trial Photo Gallery

Event highlights:
 •The Conference Program, featuring over 600 papers from the world's top researchers. Download a printable Final Conference Program (PDF) or Technical Abstract Summary (PDF) .
 •Plenary Presentations presented by the industry's leaders
 •Poster Receptions offering refreshments and one-to-one interaction with authors
 •Numerous evening panel discussions and debates
 •The Exhibition, where leading companies display their latest products
 •Printed or CD-ROM conference proceedings
 •Daily breakfast breads and coffee breaks
 •Lunches and dessert snacks


Conference topics:
EUV—sources, components, yields, resists, modeling
Alternative Technologies—maskless, nano-imprint, directed self-assembly
Optical lithography—computational, double patterning, SMO, OPC, RET
Metrology, inspection, process control, LER/LWR, mask litho, DBM
Resists materials and processing, double patterning, immersion, LER
DFM/DPI—co-optimization, layout, electrical, methodologies

Plenary Speakers:

Kazuo Ushida
President
Precision Equipment Co.
Nikon Corp.

Eric Chen
Managing Director
Silver Lake Partners

Sam Sivakumar
Director of Lithography
Portland Technology Development Group
Intel Corp.
Other program information:
 •21 Courses, taught by hand-picked instructors, covered basic through advanced topics
 •See the list of Authors, chairs, and presenters, including details of their conference participation

Sponsor

SPIE logo

Cooperating Organization

Important Author Dates

Post-Deadline Submissions
Late abstract submissions may be accepted, subject to chair approval

Author Notification:
19 October 2009

Manuscripts Due:
25 January 2010


Symposium Chair

Christopher J. Progler, Photronics Inc.

Symposium Co-chair

Donis G. Flagello, Nikon Research Corp. of America

Innovation Starts Here


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