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SPIE Advanced Lithography 27 February - 4 March 2011
San Jose, California, USA

Present your work at the premier event in Optical Lithography, Resists, Metrology, EUV, Immersion, and More

Courtesy of Georgia Tech. Photo by Gary Meek.

Drive the technology roadmap by presenting and publishing your research at SPIE Advanced Lithography. Increase your company's footprint, assure your attendance, and take the first step towards worldwide exposure through the SPIE Digital Library.

To accommodate the needs of the technical community, the abstract due date has been extended to 8 September 2010. 

  • View the Call for Papers online
  • Download the Call for Papers (PDF)
  • View the Invitation from Chairs Donis Flagello (Nikon Research Corp. of America) and Harry Levinson (GLOBALFOUNDRIES Inc.)
  • Plenary presenters will include:
    • Luc Van den hove, President and CEO, IMEC (Belgium)
    • Dr. Shang-yi Chiang, Senior Vice-President of Research & Development, Taiwan Semiconductor Manufacturing Corp. (Taiwan) 

Accepting papers on: 

Optical Microlithography
EUV Lithography
Advances in Resist Materials and Processing Technology
Metrology, Inspection, and Process Control
Alternative Lithographic Technologies
Design for Manufacturability through Design-process Integration

Why did 2010 authors present their work at SPIE Advanced Lithography?

 •“For anyone working in lithography it is exactly the correct audience.”
 •“Good exposure, good audience, good publication.”
 •“The most important symposium on lithography.”
 •“Best forum to gain attention from industry decision-makers.”
 •“Exposure, collaboration, business.”
 •“It reminds our customers that we are a world-class innovation company.”




Interested in exhibiting?
 •Download the Exhibitor Contract
 •View the list of exhibitors


View 2010 program details:
 •Printable Final Program (PDF)
 •Conference Abstracts (PDF)

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Important Author Dates

Extended Abstract Due Date
8 September 2010

Author Notification:
25 October 2010

Manuscripts Due:
31 January 2011


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